| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device capable of efficiently performing an exposure process even for a substrate with which disconnection process after pattern formation is difficult to perform. <P>SOLUTION: An exposure device 10 is of proximity type or contact type that performs exposure on a substrate 21 with exposure light from an illumination system 1 via a mask (18a and so on). In the illumination system 1, an illumination possible area La where the mask can be illuminated is set at a dimension which is obtained by dividing the mask into multiple portions. The illumination system 1 can allocate the illumination possible area La over the whole region of the mask by moving with respect to the mask. <P>COPYRIGHT: (C)2013,JPO&INPIT |
