发明名称 |
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USING PROCESSING SOLUTION |
摘要 |
Nozzle arms for holding discharge heads are caused by a pivotal driving part to move between a processing position above a substrate and a standby position outside a processing cup surrounding a substrate. When the nozzle arms having cleaned a substrate is placed at the standby position, a cleaning solution is ejected from a shower nozzle toward the nozzle arms arranged obliquely downward of the shower nozzle. The three nozzle arms are caused to move up and down such that the nozzle arms cut across a jet of a cleaning solution discharged obliquely downward, thereby cleaning the three nozzle arms in order. Then, a nitrogen gas is ejected from a drying gas nozzle and sprayed on the nozzle arms to remove the cleaning solution attached to the nozzle arms, thereby drying the nozzle arms.
|
申请公布号 |
US2013020284(A1) |
申请公布日期 |
2013.01.24 |
申请号 |
US201213539626 |
申请日期 |
2012.07.02 |
申请人 |
OSADA NAOYUKI;SUGIMOTO KENTARO |
发明人 |
OSADA NAOYUKI;SUGIMOTO KENTARO |
分类号 |
B05B15/00;B05B1/18;B44C1/22 |
主分类号 |
B05B15/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|