发明名称 POLYIMIDE FILM, AND COPPER-CLAD LAMINATE USING THE SAME AS SUBSTRATE MATERIAL
摘要 <P>PROBLEM TO BE SOLVED: To provide a polyimide film excellent in dimensional stability and suitable for a substrate for fine pitch circuit, particularly COF (Chip on film) in which wiring is carried out at naroow pitches in the width direction, and a copper-clad laminate using the same as a substrate material. <P>SOLUTION: The polyimide film has a thermal expansion coefficient &alpha;MD in the machine transport direction (MD) of the film of 3 to 10 ppm/&deg;C, and a thermal expansion coefficient &alpha;TD in the transverse direction (TD) of 10 to 20 ppm/&deg;C. With the polyimide film used as a substrate material, copper of 1 to 10 &mu;m in thickness is formed thereon. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013014776(A) 申请公布日期 2013.01.24
申请号 JP20120194817 申请日期 2012.09.05
申请人 DU PONT-TORAY CO LTD 发明人 SAWAZAKI KOICHI;KOKUNI MASAHIRO;TESHIBA TOSHIHIRO
分类号 C08J5/18;B32B7/02;B32B15/08;B32B15/088;B32B15/20;B32B27/34 主分类号 C08J5/18
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