发明名称 MULTIPLE QUANTUM WELL FOR ULTRAVIOLET LIGHT EMITTING DIODE AND A PRODUCTION METHOD THEREFOR
摘要 Provided is a multiple quantum well for an ultraviolet light emitting diode, comprising: an Alx1Ga1-x1N barrier unit in which are alternately disposed an AlN barrier atomic layer and a GaN barrier atomic layer on the AlN barrier atomic layer; and an Alx2Ga1-x2N quantum well unit in which are alternately disposed an AlN well atomic layer formed on the Alx1Ga1-x1N barrier unit and a GaN well atomic layer formed on the AlN well atomic layer. The Al compositional ratio (x1) in the Alx1Ga1-x1N barrier unit is between 0 and 0.7; the Al compositional ratio (x2) in the Alx2Ga1-x2N quantum well unit is between 0 and 0.7; the Al compositional ratio (x1) in the Alx1Ga1-x1N barrier unit is larger than the Al compositional ratio (x2) in the Alx2Ga1-x2N quantum well unit; and the Alx1Ga1-x1N barrier unit and the Alx2Ga1-x2N quantum well unit are alternately laminated at least twice.
申请公布号 WO2013012232(A2) 申请公布日期 2013.01.24
申请号 WO2012KR05660 申请日期 2012.07.16
申请人 CHIP TECHNOLOGY CO., LTD;CHO, BYOUNG-GU;MIN, JAE-SIK;KWON, SE-HUN 发明人 CHO, BYOUNG-GU;MIN, JAE-SIK;KWON, SE-HUN
分类号 H01L33/04;H01L33/06 主分类号 H01L33/04
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