发明名称 |
BONDING SYSTEM, SUBSTRATE PROCESSING SYSTEM, AND BONDING METHOD |
摘要 |
<p>This bonding system comprises a bonding station and a carry in/out station which carries a substrate to be processed, a supporting substrate or a bonded substrate that is obtained by bonding a substrate to be processed and a supporting substrate with each other into/out of the bonding station. The bonding station comprises: a coating device which applies an adhesive to the substrate to be processed or the supporting substrate; a heat treatment device that heats the substrate, to which the adhesive has been applied, to a predetermined temperature; a bonding device which turns over the supporting substrate that is to be bonded to the heated substrate to be processed or the substrate to be processed that is to be bonded to the heated supporting substrate and which presses the overturned substrate against the heated substrate with an adhesive being interposed therebetween, thereby bonding the substrates with each other; and a conveyance region for conveying these substrates to the coating device, the heat treatment device and the bonding device.</p> |
申请公布号 |
WO2013011806(A1) |
申请公布日期 |
2013.01.24 |
申请号 |
WO2012JP66135 |
申请日期 |
2012.06.25 |
申请人 |
TOKYO ELECTRON LIMITED;HIRAKAWA, OSAMU;YOSHITAKA, NAOTO;MATSUNAGA, MASATAKA;OKAMOTO, NORIHIKO |
发明人 |
HIRAKAWA, OSAMU;YOSHITAKA, NAOTO;MATSUNAGA, MASATAKA;OKAMOTO, NORIHIKO |
分类号 |
H01L21/02;H01L21/677 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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