发明名称 VACUUM PIPE TRAP SYSTEM FOR SILICON SINGLE CRYSTAL GROWTH DEVICE AND PIPE CLEANING METHOD USING THE SYSTEM
摘要 <p>[Problem] To provide a vacuum pipe trap system for a silicon single crystal growth device and a pipe cleaning method using the system, the vacuum pipe trap system capable of reducing the time and effort required for cleaning work while preventing a dust explosion of trapped silicon oxide. [Solution] A vacuum pipe trap system is provided with a heating unit and a trap unit disposed downstream from the heating unit. The heating unit is configured from a movable tube that forms an exhaust gas passage, and a heater that surrounds the movable tube. A trap housing of the trap unit is divisible into an upper housing and a lower housing, a closed-bottomed trap cylinder is affixed to a center ring inserted in a connection part, and a cooling cylinder hanging from the inner surface of the upper housing and housed in the trap cylinder is provided. A first trap fin is disengageably attached to a hollow part of the cooling cylinder, a second trap fin is disengageably attached to the outer peripheral surface of the cooling cylinder, and an exhaust port that penetrates the side surface of the lower housing and the side surface of the trap cylinder is provided. The cooling cylinder has an outer shape with the diameter thereof gradually decreasing from the base end side to the leading end, forms an exhaust gas passage continuous from a reducer, and is open near the bottom surface of the trap cylinder.</p>
申请公布号 WO2013011582(A1) 申请公布日期 2013.01.24
申请号 WO2011JP66502 申请日期 2011.07.20
申请人 FTB RESEARCH INSTITUTE CO., LTD;HORIOKA YUKICHI;ASAHI SANGYO KAISHA, LTD.;WESTEC-FIELD CORPORATION;MIYAWAKI KOJI;NISHIMURA YOSHIMI 发明人 HORIOKA YUKICHI;MIYAWAKI KOJI;NISHIMURA YOSHIMI
分类号 C30B29/06;C30B15/20;F04B39/16 主分类号 C30B29/06
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