| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technology which is advantageous in determining an exposure condition in an exposure device. <P>SOLUTION: The determination method which determines an exposure condition includes: steps (S102, S104, and S106) for setting a mask parameter, an illumination parameter related to light intensity distribution, and an aberration parameter related to the aberration of a projection optical system; a step (S108) for setting an evaluation place for evaluating an optical image of a pattern of the mask that is formed on an image plane of the projection optical system; and steps (S110, S112) in which, in order that an image performance of the optical image of the pattern of the mask formed at the evaluation place satisfies an evaluation reference set for a target pattern that should be formed on the image plane of the projection optical system, a value of the mask parameter, a value of the illumination parameter, and a value of the aberration parameter are determined, and a mask pattern regulated by the determined value of mask parameter, the value of illumination parameter, and the value of aberration parameter, a light intensity distribution formed on a pupil plane of an illumination optical system, and an aberration of the projection optical system are determined as an exposure condition. <P>COPYRIGHT: (C)2013,JPO&INPIT |
