发明名称 METHOD FOR EVALUATING PATTERNED RETARDATION FILM
摘要 <P>PROBLEM TO BE SOLVED: To provide an evaluation method capable of simply evaluating the size and shape of an area of a patterned retardation film. <P>SOLUTION: An evaluation system comprises: a pair of liner polarizing plates or a pair of circularly polarizing plates disposed in a crossed-Nicol state; patterned retardation films provided between the pair of liner polarizing plates or the pair of circularly polarizing plates; a light source provided on the side opposite to one of the patterned retardation films of the pair of liner polarizing plates or the pair of circularly polarizing plates; and a mask provided between the light source and the side opposite to the other patterned retardation film of the pair of liner polarizing plates or the pair of circularly polarizing plates or one of the pair of linear polarizing plates or the pair of circularly polarizing plates. The patterned retardation film has a plurality of kinds of areas having retardation, and the mask is equipped with a light shielding part and a light translucent part. A method for evaluating a patterned retardation film includes observing light which is emitted by the light source from the side opposite to the light source of the mask in a state where the light source is shinned. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013015563(A) 申请公布日期 2013.01.24
申请号 JP20110146298 申请日期 2011.06.30
申请人 NIPPON ZEON CO LTD 发明人 OISHI HITOSHI
分类号 G02B5/30;G02B27/26;G02B27/28;G02F1/1335;G02F1/13363 主分类号 G02B5/30
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