| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate treating apparatus for treating a substrate using a supercritical fluid and a method for discharging the supercritical fluid using the same. <P>SOLUTION: The substrate treating apparatus includes a container for providing a supercritical fluid, a vent line through which the supercritical fluid is discharged from the container, and a freezing prevention unit disposed in the vent line to prevent the supercritical fluid from being frozen. <P>COPYRIGHT: (C)2013,JPO&INPIT |
