发明名称 ELECTROLESS NICKEL PLATING FILM AND ELECTROLESS NICKEL PLATING SOLUTION
摘要 <P>PROBLEM TO BE SOLVED: To provide an electroless nickel plating solution which can minimize the contamination of an electroless plating film with environmentally hazardous substances other than nickel, yet has excellent stability, and can provide a plating film having excellent mechanical properties. <P>SOLUTION: The electroless nickel plating film contains 0.5-4 wt.% phosphorus, 0.01-2 wt.% boron, and 0.1-5 wt.% tin. The electroless nickel plating film can be obtained by using the electroless nickel plating solution containing 0.04-0.2 mol/L of nickel ions, 0.09-0.5 mol/L of hypophosphite ions, 1-80 mmol/L of tetrahydro borate ions, and 50-1,000 &mu;mol/L of divalent tin ions. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013014809(A) 申请公布日期 2013.01.24
申请号 JP20110149138 申请日期 2011.07.05
申请人 NIPPON KANIZEN KK 发明人 WATANABE KENJI;WATANABE SUMITAKA
分类号 C23C18/36;C23C18/50 主分类号 C23C18/36
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