| 摘要 |
An efficient method to compute critical area for shorts and breaks in rectilinear layouts in Very Large Scale Integrated (VLSI) circuits. The method is incremental and works in the L INFINITY geometry and has three major steps: Compute critical area for rectilinear layouts for both extra material and missing material defects (i.e., shorts and opens) by modeling defects as squares (which corresponds to the L INFINITY metric) instead of circles (Euclidean geometry). Treat the critical region for shorts and opens between any two edges or corners of the layout as a rectangle that grows uniformly as the defect radius increases. This is valid for rectilinear layouts and square defects (L INFINITY metric) . Use an incremental critical area algorithm for shorts and opens, which are computed for rectilinear layouts assuming square defects. Non-rectilinear layouts are approximated, first, by a rectilinear layout using a shape processing tool. The critical area for the rectilinear approximation is computed using the preferred incremental method. |
