发明名称 SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To suppress deterioration in yield due to that the variance of the pattern processing depending on the variance of a manufacturing process for a semiconductor device exceeds an allowable range. SOLUTION: This semiconductor device comprises a correction discrimination detection circuit 11 for generating a detection signal if the variance of the pattern processing exceeds a predetermined allowable range while monitoring the variance of the pattern processing depending on the variance of the manufacturing process, and a characteristic correction circuit 12 for correcting electric characteristics of the subject circuit based on the detection signal of the correction discrimination detection circuit.
申请公布号 JP2002329789(A) 申请公布日期 2002.11.15
申请号 JP20010133463 申请日期 2001.04.27
申请人 TOSHIBA MICROELECTRONICS CORP;TOSHIBA CORP 发明人 INUTSUKA TATSUMI
分类号 H01L21/822;H01L27/04;(IPC1-7):H01L21/822 主分类号 H01L21/822
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