| 摘要 |
PURPOSE: Provided are a norbornene-based copolymer for photoresist, a method for preparing the same, and a photoresist composition comprising the same, wherein the photoresist composition can form a pattern profile excellent in resolution and adhesion to substrate. CONSTITUTION: The norbornene-based copolymer, particularly 5-norbonene-2-alkane-1,3-dion derivative is represented by formula 1b(wherein R1 is C1-C12, linear, branched, or cyclic alkyl group, R2 is hydrogen atom, or C1-C6, linear, branched or cyclic alkyl group, R3, R4 and R5 are independently hydrogen atom, or C1-C6, linear, branched or cyclic alkyl group, and R1 and R5 together form a cyclic diketone, each of R6 and R7 is independently C1-C6 alkyl group, and R6 and R7 together form a ring, and p is an integer of 0-6).
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