发明名称 |
METHOD OF FORMING THIN FILM PATTERN AND METHOD OF MANUFACTURING DEVICE, ELECTROOPTICAL DEVICE AND ELECTRONIC APPARATUS |
摘要 |
The invention provides a forming process of a thin film pattern capable of properly realizing a thin line. The forming process of a thin film pattern of the invention can be a process of forming a thin film pattern by arranging a functional liquid on a substrate P. The process can include a bank forming step to set up banks protrudingly on the substrate corresponding to the thin film pattern, a repellent liquefaction step of imparting a liquid repellent property to the bank by CF<SUB>4 </SUB>plasma processing, and a material arranging step of arranging the functional liquid between the banks imparted with the liquid repellent property. |
申请公布号 |
KR100690547(B1) |
申请公布日期 |
2007.03.12 |
申请号 |
KR20060024205 |
申请日期 |
2006.03.16 |
申请人 |
|
发明人 |
|
分类号 |
G02F1/13;H01L21/02;B05D1/26;B05D3/04;G02F1/1333;H01L21/20;H01L21/208;H01L21/288;H01L21/3205;H01L21/768;H05K3/12 |
主分类号 |
G02F1/13 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|