发明名称 Wet-processing apparatus
摘要 A wet-processing apparatus, which spouts a coating liquid onto a surface of a substrate, includes: nozzles provided with passages for the coating liquid; a light source which illuminates an area between a plane containing the tips of the nozzles and the surface of the substrate; a camera for forming an image of the area; a control unit which provides a spout signal requesting spouting the liquid from the nozzle toward the substrate, and an imaging signal requesting the camera to start an imaging operation; and a decision unit which decides whether or not the liquid was spouted from the nozzle and whether or not changes occurred in the condition of the liquid spouted from the nozzle toward the substrate on the basis of an image formed by the camera and expressing the brightness of the liquid spouted toward the substrate and illuminated by light emitted by the light source.
申请公布号 US8356951(B2) 申请公布日期 2013.01.22
申请号 US201113105040 申请日期 2011.05.11
申请人 TOKYO ELECTRON LIMITED;NODA YASUAKI;FUKUTOMI AKIRA;HAYAMA TAKAFUMI 发明人 NODA YASUAKI;FUKUTOMI AKIRA;HAYAMA TAKAFUMI
分类号 G03D5/00 主分类号 G03D5/00
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