发明名称
摘要 An atmosphere of an inert gas inside a chamber room in a chamber apparatus is replaced with an outside air by opening a discharge passage in the chamber room and by closing a gas supply passage for supplying the inert gas. The outside air is thus forcibly sent to the chamber room to thereby replace the inert gas remaining inside the chamber room with the outside air.
申请公布号 JP3979113(B2) 申请公布日期 2007.09.19
申请号 JP20020034031 申请日期 2002.02.12
申请人 发明人
分类号 H05B33/10;B01J4/00;H01L21/02;H01L51/40;H01L51/50 主分类号 H05B33/10
代理机构 代理人
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