APPARATUS AND MOTHOD FOR TREATING SUBSTRATE

摘要

PURPOSE: An apparatus and a method for processing a substrate are provided to prevent the substrate from being damaged by drying the substrate using supercritical fluid. CONSTITUTION: A supercritical fluid supply unit includes a storage tank, a feeding tank, a first condenser, a second condenser, and a pump. The feeding tank provides supercritical fluid to a second process chamber. The second process chamber dries the substrate using the supercritical fluid. The pump changes liquefied carbon dioxide into pressed gas and supplies the pressed gas to the feeding tank. A reproducing unit(4000) includes a separating module(4100) and a column module(4200). The separating module separates organic solvent from carbon dioxide.