| 摘要 |
PURPOSE: A linear nozzle for depositing a thin film and a thin film depositing apparatus thereof are provided to constantly maintain the thickness of a thin film formed on the substrate by controlling a spray speed of deposition materials through each spray hole in the linear nozzle. CONSTITUTION: A linear nozzle(30) is installed in the bottom of a vacuum chamber and includes a plurality of spray holes(313) installed on an opposite surface(311) along a width direction. An inhalation hole(314) is formed on one side of the bottom(315) facing the opposite surface. An incline(317) has an ascent far away from the inhalation hole. Deposition materials evaporated by the source supply unit are supplied to the linear nozzle with high pressure.
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