| 摘要 |
<P>PROBLEM TO BE SOLVED: To effectively remove ink from a substrate, to suppress contamination of the substrate, and to improve productivity in a patterning device. <P>SOLUTION: A patterning device 1 includes a wiping-off mechanism 4 for removing ink 30 at a prescribed part on a substrate 20. The wiping-off mechanism 4 includes a tape 41 containing a solvent 40, a rotary type reel 42 for winding the tape 41, and a tape head 43 for abutting the tape 41 onto the substrate 20. The tape 41 is abutted to the substrate 20 by the tape head 43, and the ink 30 on the substrate 20 is stuck to the tape 41. By the configuration, when the ink 30 is wiped off with the tape 41, since the wiping-off surface of the tape 41 is a new surface at all times, the ink 30 is efficiently removed, and the tape 41 is not easily degraded. Also, since shavings or the like are not easily generated even when used for a long period of time, the contamination of the substrate 20 is suppressed, and the productivity is improved. <P>COPYRIGHT: (C)2013,JPO&INPIT |
