| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent the exposure power and/or focus state from changing due to changes in the conditions of the substrate surface or optical system devices of an exposure device. <P>SOLUTION: Power control and focus position are controlled by using a light beam reflected by four-divided detector 223c of an astigmatic optical system 223; i.e. a master disk 121. A polarizer is provided to a predetermined position of the optical system to constantly maintain the polarization state of the beam. With this, a high precise power control is achieved. Thus, an exposure device of an optical master disk superior in maintenance performance is achieved. <P>COPYRIGHT: (C)2013,JPO&INPIT |
