发明名称 ANODIZED ALUMINA SELF-SUPPORTED FILM HOLLOW STRUCTURE AND METHOD OF MANUFACTURING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a cylindrical anodized alumina self-supported film hollow structure of a greater film thickness. <P>SOLUTION: A hollow structure 1 comprising a material containing aluminum is prepared. By turning the hollow structure 1 to an anode and applying a voltage between that and a corresponding cathode 3, an alumina oxide film 36 is formed on the surface of the hollow structure 1. In the process of forming the alumina oxide film 36, the alumina oxide film 36 is formed while performing at least one of the operation of jetting treatment liquid C in a direction oblique to an axial direction X toward the hollow structure 1 and the operation of displacing the cathode 3 and the hollow structure 1 relative to each other by rotating at least one of the hollow structure 1 and the cathode 3. The treatment liquid C is jetted with vertexes 21, 22 and 23 of a triangle circumscribing the minimum circle including in the inside an outer shape part of a cross section for which the hollow structure 1 is cut off on a plane whose normal is the axial direction X, as at least start points. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013010979(A) 申请公布日期 2013.01.17
申请号 JP20110142929 申请日期 2011.06.28
申请人 SUMITOMO ELECTRIC IND LTD 发明人 KATAYAMA TETSUYA
分类号 C25D11/04;C25D11/00 主分类号 C25D11/04
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