发明名称 Dual damascene structure and methods of forming the same
摘要 A dual damascene structure and a method of forming a dual damascene structure are disclosed. The dual damascene structure includes an insulation member, a single crystal member and a filling member. The insulation member has an opening having a dual damascene shape. The filling member is formed on a side face of the opening. The single crystal member contacts the filling member. The single crystal member fills up the opening. In order to form a dual damascene structure, an insulating member having an opening partially filled with a preliminary single crystal member is formed. The filling member is formed on a side face of the opening. The preliminary single crystal member epitaxially grows to fill up the opening. Because the filling member is positioned between the single crystal member and the insulation member, void formation may be reduced between the single crystal member and the insulation member.
申请公布号 US7358126(B2) 申请公布日期 2008.04.15
申请号 US20060333110 申请日期 2006.01.17
申请人 发明人
分类号 H01L21/4763 主分类号 H01L21/4763
代理机构 代理人
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