Plasma etching apparatus and texturing method for solarcell using same

摘要

PURPOSE: A plasma-etching apparatus and a texturing method of a solar cell using the same are provided to form low reflectivity by arranging a metal structure within a chamber and using remote plasma. CONSTITUTION: A processing chamber(100) performs an etching process. A first electrode(110) is arranged in one side of the processing chamber. A second electrode(120) is arranged in the other side of the processing chamber. A chuck is installed at the front side of the second electrode. A mesh structure(140) is arranged between the first electrode and the second electrode. A plurality of minute holes is formed on the mesh structure in order to pass plasma which is formed through the first electrode and the second electrode. [Reference numerals] (AA) GAS; (BB) Plasma