发明名称 MEMBRANE FOR CHEMICAL MECHANICAL POLISHING
摘要 PURPOSE: A membrane for chemical mechanical polishing device is provided to prevent the discoloration by a by-product by using platinum-based catalyst instead of a peroxide initiator. CONSTITUTION: Poly silicon compound consists of polymer chains. The polymer chains are cross-linked at the end of the poly silicon compound. The polymer chains are combined with vinyl group. Platinum catalyst is used for crosslink reaction. Silicon particles are filled in the poly silicon compound. [Reference numerals] (AA) Before aging test; (BB) After aging test; (CC) Longitude(shoah A); (DD) M company; (EE) This invention
申请公布号 KR101221852(B1) 申请公布日期 2013.01.15
申请号 KR20110075829 申请日期 2011.07.29
申请人 RION CO., LTD. 发明人 CHUNG, KU CHAN;PARK, KI WOONG;LEE, DOO HYUN
分类号 H01L21/304 主分类号 H01L21/304
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