| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a fluorosurfactant having 6C or less fluorinated alkyl, which has, in addition to excellent defoaming property, leveling property equal to or more than a surfactant having 8C or more fluorinated alkyl, and to provide a coating composition and a resist composition using the fluorosurfactant. <P>SOLUTION: The fluorosurfactant includes a monomer (m1) having 6C or less fluorinated alkyl (including a one having ether bond by oxygen atom) and a non-fluorinated monomer (m2) as essential monomer components, and is produced by performing living radical polymerization in the coexistence of the monomers (m1) and (m2). <P>COPYRIGHT: (C)2013,JPO&INPIT |
