| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technique for shading light entering an outer peripheral region located inside from an outer periphery of a substrate by a predetermined width even when a center position of the substrate and a center position of arrays of shot regions on the substrate are deviated. <P>SOLUTION: An exposure apparatus comprises: a shading plate 19; a driving part 22; a detection part; and a control section 21. The shading plate 19 is disposed on a plane conjugated with an object plane of a projection optical system 5 in an illumination optical system 1, and defines a region to which a pattern on a substrate 9 is transferred, an edge of the region including a circular arc overlapping with a circular boundary line located inside an outer periphery of the substrate 9. The driving part 22 drives the shading plate 19 in an outer peripheral shot region on the substrate 9. The detection part detects an amount of deviation between a center position of the substrate 9 and a center position of a plurality of arrays of shot regions in a layer formed on the substrate 9. The control part 21 performs a first control to control the driving part 22 so that when the outer peripheral shot region is exposed, the shading plate 19 is positioned at a position to shade light entering an outer peripheral region located inside from the outer periphery of the substrate 9 by a predetermined width, on the basis of the amount of deviation detected by the detection part. <P>COPYRIGHT: (C)2013,JPO&INPIT |
