| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a solid-state imaging apparatus having a color filter with less misalignment against a photoelectric conversion layer, and manufacturing method thereof. <P>SOLUTION: A solid-state imaging apparatus comprises: a photoelectric conversion layer 15 formed in a semiconductor substrate 10 for converting an incident light into an electric signal; a circuit formed on a surface of the semiconductor substrate 10 for processing an electric signal output from the photoelectric conversion layer 15; and red, green, and blue filters 23R, 23G, 23B disposed in a backside of the semiconductor substrate 10 corresponding to the photoelectric conversion layer 15. A light going through the semiconductor substrate 10 is transmissive against the red filter 23R. In a cross section vertical to the backside of the semiconductor substrate 10, the red filter 23R has a longer bottom surface than an upper surface thereof, and the green filter 23G has a shorter bottom surface than an upper surface thereof. <P>COPYRIGHT: (C)2013,JPO&INPIT |
