发明名称 AGENT FOR PREVENTING OR AMELIORATING CHAPPED SKIN
摘要 <P>PROBLEM TO BE SOLVED: To provide a new agent for preventing or ameliorating chapped skin and a skin care preparation that comprises a component and prevents or ameliorates chapped skin. <P>SOLUTION: The agent for preventing or ameliorating chapped skin comprises a compound represented by general formula (1) [wherein R<SB POS="POST">1</SB>is an unsubstituted or substituent-containing aromatic group; R<SB POS="POST">2</SB>is a hydrogen atom, 1-4C straight-chain or branched alkyl, 1-4C straight-chain or branched alkyl chain-containing acyl; R<SB POS="POST">3</SB>is a hydrogen atom, 1-4C straight-chain or branched alkyl], its optical isomer and/or their pharmacologically acceptable salts. The skin care preparation for preventing or ameliorating chapped skin comprises the component. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013001658(A) 申请公布日期 2013.01.07
申请号 JP20110131866 申请日期 2011.06.14
申请人 POLA CHEMICAL INDUSTRIES INC 发明人 SHIMANUKI TOMOMASA;YOKOYAMA KOJI
分类号 A61K8/44;A61Q19/00 主分类号 A61K8/44
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