| 摘要 |
<p>Provided is Co-Cr-Pt-B alloy sputtering target characterized in that there are no more than 10 cracks of 0.1 to 20 µm in a B-rich phase in a 100 µm × 100 µ area (field of view). This method for producing the Co-Cr-Pt-B alloy sputtering target is characterized in that: after a Co-Cr-Pt-B alloy cast ingot has been hot forged or hot rolled, hot rolling or hot forging is carried out to an elongation of 4% or less, and the ingot is machined and manufactured into a target having no more than 10 cracks of 0.1 to 20 µm in a B-rich phase in a 100 µm × 100 µm area (field of view); or, after hot rolling or hot forging the ingot, the ingot is rapidly cooled to -196°C to 100°C, machined and manufactured into a target. This target has a high leakage flux density and few microcracks in a B-rich layer, and thus stabilizes discharge and minimizes arcing.</p> |
