TEXTURE ETCHANT COMPOSITION FOR CRYSTALLINE SILICON WAFER AND TEXTURE ETCHING METHOD THEREOF

摘要

The present invention relates to a texture etchant composition for a crystalline silicon wafer and a texture etching method thereof, and more specifically to a texture etchant composition for a crystalline silicon wafer, which is capable of maximizing the absorbed amount of sunlight by including the optimal amount of alkali compounds, cyclic compounds, polysaccharides and residual water, improving texture uniformity according to a position on the surface of the crystalline silicon wafer, improving optical efficiency by reducing light reflectivity, and increasing the number of processed wafers according to the amount used per unit, and a texture etching method thereof.