发明名称 Single crystal growth method and single crystal pulling apparatus for improving yield and productivity of single crystal
摘要 The present invention resides in a silicon single crystal growth method of pulling up and growing a single crystal from a melt of a silicon raw material in a quartz crucible based on a Czochralski method, wherein the method comprises the steps of: applying a DC voltage between an outer wall of the quartz crucible acts as a positive electrode and a pulling wire or pulling shaft for pulling up the silicon single crystal acts as a negative electrode; and fixing an electric current flowing through the silicon single crystal over a period of time for pulling up the single crystal, to grow the single crystal; as well as a pulling apparatus therefor.
申请公布号 US8343275(B2) 申请公布日期 2013.01.01
申请号 US20080449878 申请日期 2008.02.28
申请人 SHIN-ETSU HANDOTAI CO., LTD.;MIYAHARA YUUICHI;IWASAKI ATSUSHI;ODA TETSUHIRO 发明人 MIYAHARA YUUICHI;IWASAKI ATSUSHI;ODA TETSUHIRO
分类号 C30B15/22 主分类号 C30B15/22
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