发明名称 |
Ceiling plate and plasma process apparatus |
摘要 |
A ceiling plate provided at a ceiling portion of a process chamber that may be evacuated to a vacuum is disclosed. The ceiling plate allows microwaves emitted from a slot of a planar antenna member provided along with the ceiling plate to pass through the ceiling plate into the process chamber, and includes plural concave portions provided along a circle on a surface of the ceiling plate, the surface facing toward an inside of the process chamber.
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申请公布号 |
US8343308(B2) |
申请公布日期 |
2013.01.01 |
申请号 |
US20080441429 |
申请日期 |
2008.08.20 |
申请人 |
TOKYO ELECTRON LIMITED;TIAN CAIZHONG;NISHIZUKA TETSUYA;ISHIBASHI KIYOTAKA;NOZAWA TOSHIHISA |
发明人 |
TIAN CAIZHONG;NISHIZUKA TETSUYA;ISHIBASHI KIYOTAKA;NOZAWA TOSHIHISA |
分类号 |
C23C16/00;C23F1/00;H01L21/306 |
主分类号 |
C23C16/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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