发明名称 THIN FILM TRANSISTOR AND METHOD OF MANUFACTURING THE SAME
摘要 <p>PURPOSE: A thin film transistor and a manufacturing method thereof are provided to improve an electric property of a device by including source and drain electrodes with a constant pattern. CONSTITUTION: A gate electrode(20) is formed on an insulated transparent substrate. A gate insulation layer(30) is formed on the gate electrode. A semiconductor layer(40) is formed on the gate insulation layer and includes a channel region. A source electrode(50) and a drain electrode(60) are formed on the semiconductor layer. One of the source and drain electrodes is formed with a pattern including a plurality of slits and generates a fringe field.</p>
申请公布号 KR20120140549(A) 申请公布日期 2012.12.31
申请号 KR20110060357 申请日期 2011.06.21
申请人 IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY) 发明人 KIM, JAE HOON
分类号 H01L29/786;G02F1/136;H01L21/336 主分类号 H01L29/786
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