VAPOR DEPOSITION SYSTEM AND SUPPLY HEAD

摘要

A vapor deposition system for delivering a mixture of a carrier gas and a deposition gas to a temperature controlled target substrate comprising a rotor; a stator positioned within the rotor for relative rotational movement between the stator and the rotor, the rotor including a plurality of support faces, each of the support faces having a frame mounted thereto; an electrically conductive, three-dimensional, open cell, reticulated structure heater element having a solid coating of a selected vapor deposition material vapor deposited thereon supported within each frame, the heater element capable of controllably vaporizing the solid coating; a carrier gas feed tube connected to the stator for delivering carrier gas to a delivery duct within the stator; a plurality of facet ducts in the rotor, each facet duct aligning with a respective support face, the relative rotational movement of the rotor and stator allowing the delivery duct to be aligned with any selected one of the facet ducts, the carrier gas thereby flowing through the heater element adjacent the selected facet duct.