发明名称 METHODS FOR CMOS-MEMS INTEGRATED DEVICES WITH MULTIPLE SEALED CAVITIES MAINTAINED AT VARIOUS PRESSURES
摘要 A Microelectromechanical systems (MEMS) structure comprises a MEMS wafer. A MEMS wafer includes a handle wafer with cavities bonded to a device wafer through a dielectric layer disposed between the handle and device wafers. The MEMS wafer also includes a moveable portion of the device wafer suspended over a cavity in the handle wafer. Four methods are described to create two or more enclosures having multiple gas pressure or compositions on a single substrate including, each enclosure containing a moveable portion. The methods include: A. Forming a secondary sealed enclosure, B. Creating multiple ambient enclosures during wafer bonding, C. Creating and breaching an internal gas reservoir, and D. Forming and subsequently sealing a controlled leak/breach into the enclosure.
申请公布号 US2012326248(A1) 申请公布日期 2012.12.27
申请号 US201213535180 申请日期 2012.06.27
申请人 DANEMAN MICHAEL;LIM MARTIN;HUANG KEGANG;TCHERTKOV IGOR;INVENSENSE, INC. 发明人 DANEMAN MICHAEL;LIM MARTIN;HUANG KEGANG;TCHERTKOV IGOR
分类号 H01L29/84;H01L21/02 主分类号 H01L29/84
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