发明名称 |
LAMINATE FOR FORMING FINE PATTERN, AND METHOD FOR PRODUCING LAMINATE FOR FORMING FINE PATTERN |
摘要 |
Provided is a laminate for forming a fine pattern, whereby it is possible to easily form a fine pattern having a thin residual film or no residual films in order to form a fine pattern having a high aspect ratio on an object to be treated. Also provided is a method for producing said laminate for forming a fine pattern. This laminate (1) for forming a fine pattern is used for forming a fine pattern (220) on an object (200) to be treated via a first mask layer (103), the laminate (1) having: a mold (101) which has an uneven structure (101a) on the surface; and a second mask layer (102) disposed on the uneven structure (101a). The second mask layer (102) is characterized in that distance (1cc) and the height (h) of the uneven structure (101a) satisfy formula (1) and distance (1cv) and the height (h) satisfy formula (2): formula (1) being 0<1cc<1.0h and formula (2) being 0=1cv=0.05h. |
申请公布号 |
WO2012176728(A1) |
申请公布日期 |
2012.12.27 |
申请号 |
WO2012JP65494 |
申请日期 |
2012.06.18 |
申请人 |
ASAHI KASEI KABUSHIKI KAISHA;KOIKE, JUN;YAMAGUCHI, FUJITO;MAEDA, MASATOSHI;ARIHISA, SHINJI |
发明人 |
KOIKE, JUN;YAMAGUCHI, FUJITO;MAEDA, MASATOSHI;ARIHISA, SHINJI |
分类号 |
H01L21/027;B29C33/38;B29C33/40;B29C33/42;B29C33/56;B29C59/02 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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