POSITIVE-TYPE RESIST COMPOSITION

摘要

This positive-type resist composition is characterized in containing a fluoride-containing aliphatic alcohol, a polymer, a vinyl compound, and a photoacid generator, wherein the fluoride-containing alcohol is a univalent alcohol, the contained number of carbon atoms is 2-8, and the number of hydrogen atoms is no greater than the number of fluorine atoms. In the positive-type resist composition, there is minimal effect such as dissolving or swelling on organic materials, a resist film can be formed by wet coating on an organic polymer substrate, and a resist film or a resist pattern formed on the substrate exhibits excellent solvent resistance.