METHOD OF FORMING A PATTERN

摘要

PURPOSE: A method for forming a pattern is provided to smoothly form scallops of a sidewall by forming a pattern using a deep reactive ion etching. CONSTITUTION: A mask pattern(220a) is formed on a substrate(210). A sub mask pattern is formed on the sidewall of the mask pattern. The substrate is etched with a deep reactive ion etching method. A part of the mask pattern is removed to expose a part of the upper surface of the substrate. The exposed upper surface of the substrate is etched.