| 摘要 |
PURPOSE: A pattern measuring apparatus and a pattern measuring method thereof are provided to measure a width and a tilt angle of a pattern edge with high precision. CONSTITUTION: An electron scanning part(10) radiates an electron beam to the observation area of a sample surface, and scans the observation area with the electron beam. Multiple electron detectors(8) are arranged around an optical axis of the electron beam, and detect the electrons discharged from the sample surface caused by the electron beam radiation. A signal processing unit(30) generates multiple image data for the observation area each taken from different directions based on the detected signal of the electron detectors. A profile composing unit(21) extracts line profiles of a pattern formed on the sample surface from the image data from two directions, and generates the difference of the line profiles extracted from the image data from two directions. An edge detector(22) detects the upper position of the pattern edge based on the difference profile, and the lower position of the edge based on the line profile extracted from one of the image data from two directions. [Reference numerals] (20) Control unit; (21) Profile composing unit; (22) Edge detector; (23) Memory unit; (24) Image display unit; (30) Signal processing unit
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