发明名称 Galvanic Isolation Device And Method
摘要 Various exemplary embodiments relate to an isolation device including a semiconductor layer and an insulation layer. The insulation layer insulates a central portion of the semiconductor layer. A high voltage terminal connects to the insulation layer, a first low voltage terminal connects to a first non-insulated portion of the semiconductor layer, and a second low voltage terminal connects to a second non-insulated portion of the semiconductor layer. The first and second low voltage terminals are electrically connected via the semiconductor layer. A voltage applied to the high voltage terminal influences the conductance of the semiconductor layer. The high voltage terminal is galvanically isolated from the first and second low voltage terminals.
申请公布号 EP2538442(A1) 申请公布日期 2012.12.26
申请号 EP20120167815 申请日期 2012.05.14
申请人 NXP B.V. 发明人 SWANENBERG, MAARTEN JACOBUS;GOLUBAVIC, DUSAN
分类号 H01L27/02;H02H9/04 主分类号 H01L27/02
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