发明名称 Semiconductor element and solid-state imaging device
摘要 A semiconductor element includes: a p-type semiconductor region; an n-type light-receiving surface buried region buried in the semiconductor region; an n-type charge accumulation region buried in the semiconductor region, continuously to the light-receiving surface buried region, establishing a deeper potential well depth than the light-receiving surface buried region; a charge read-out region configured to read out the charges accumulated in the charge accumulation region; an exhaust-drain region buried in the semiconductor region, configured to extract the charges from the light-receiving surface buried region; a first potential controller configured to extract the charges from the light-receiving surface buried region to the exhaust-drain region; and a second potential controller configured to transfer the charges from the charge accumulation region to the charge read-out region.
申请公布号 US8338248(B2) 申请公布日期 2012.12.25
申请号 US200913142141 申请日期 2009.12.25
申请人 KAWAHITO SHOJI;NATIONAL UNIVERSITY CORPORATION SHIZUOKA UNIVERSITY 发明人 KAWAHITO SHOJI
分类号 H01L27/148;H04N5/374 主分类号 H01L27/148
代理机构 代理人
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