发明名称 Advanced roughness metrology
摘要 A method for evaluating a feature. The method includes receiving an image of the feature and determining respective coordinates of a plurality of points on an edge of the feature in the image. A figure having a non-circular and non-linear shape is fitted to the plurality of points, and respective distances between the plurality of points and the figure are determined. A roughness parameter for the feature is computed using the respective distances. The method may be applied in the analysis of critical dimensions (CD) of integrated circuits and, particularly, in the measurement of the edge roughness of their features and components as imaged using electron scanning microscopy (SEM).
申请公布号 US8340393(B2) 申请公布日期 2012.12.25
申请号 US20040596373 申请日期 2004.12.10
申请人 TAM AVIRAM;CHASE COLIN DAVID;APPLIED MATERIALS ISRAEL LIMITED 发明人 TAM AVIRAM;CHASE COLIN DAVID
分类号 G06K9/00;G01B11/24;G01N21/956;G01N23/00;G01N23/22;G01N23/225;G03F7/20;G06T7/00;G06T7/40;H01L21/66 主分类号 G06K9/00
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