发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A lithographic apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern, a substrate table configured to hold a substrate and a projection system configured to project the beam as patterned onto a target portion of the substrate. The lithographic apparatus further includes a polarization modifier disposed in a path of the beam. The polarization modifier comprises a material having a linear polarization. |
申请公布号 |
US8339574(B2) |
申请公布日期 |
2012.12.25 |
申请号 |
US20080192676 |
申请日期 |
2008.08.15 |
申请人 |
TOTZECK MICHAEL;GEH BERND PETER;MILLER SKIP;ASML NETHERLANDS B.V.;CARL ZEISS SMT GMBH |
发明人 |
TOTZECK MICHAEL;GEH BERND PETER;MILLER SKIP |
分类号 |
G02B3/10;G02B17/00;G03B27/42;G03B27/52;G03B27/54;G03B27/72 |
主分类号 |
G02B3/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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