发明名称 IMS (INJECTION MOLDED SOLDER) WITH TWO RESIST LAYERS FOR FORMING SOLDER BUMPS ON SUBSTRATES
摘要 A photoresist layer is applied over a solder resist layer on a substrate such as a wafer. Openings in the solder resist and photoresist layers are filled with flux-free molten solder using IMS. The process is applicable to fine pitch applications and chip size packaging substrates. A protection layer may be employed to facilitate removal of the photoresist layer from the substrate. An oversized substrate including an adhesive layer on a peripheral area may be employed for providing greater adhesion of a dry film layer to the peripheral area of the substrate than the central portion thereof. The peripheral area is removed following IMS.
申请公布号 US2012318855(A1) 申请公布日期 2012.12.20
申请号 US201113164728 申请日期 2011.06.20
申请人 MCLEOD MARK H.;NAH JAE-WOONG;INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 MCLEOD MARK H.;NAH JAE-WOONG
分类号 B23K1/20 主分类号 B23K1/20
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