发明名称 LITHOGRAPHIC APPARATUS AND METHOD OF OPERATING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To disclose a lithographic projection apparatus comprising a table, a shutter member, fluid handling structure, and a fluid extraction system. <P>SOLUTION: Fluid handling structure supplies and shuts in liquid between a projection system and (i) a substrate, (ii) a substrate table, (iii) a surface of a shutter member, or (iv) an arbitrary combination selected from (i)-(iii). The surface of the shutter member adjoins a surface of the table and is disposed on the same surface of the table. The surface of the shutter member and the surface of the table can be separated by gap. A fluid extraction system removes the liquid from the gap. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012253389(A) 申请公布日期 2012.12.20
申请号 JP20120208465 申请日期 2012.09.21
申请人 ASML NETHERLANDS BV 发明人 CLOIN CHRISTIAN GERARDUS NORBERTUS HENDRICUS MARIE;KATE NICOLAAS TEN;KEMPER NICOLAAS R;STAVENGA MARCO KOERT;EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA;RIEPEN MICHAEL;ELISSEEVA OLGA VLADIMIROVNA;WILFRED MATHIJS GUNTHER TIJMEN;VAN DER WEKKEN MICHAEL CHRISTIAAN
分类号 H01L21/027 主分类号 H01L21/027
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