| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide substrate processing equipment capable of selectively enforcing dry cleaning and wet cleaning, and a substrate processing method. <P>SOLUTION: The substrate processing equipment includes: an index unit 1000 that has a port 1100, where a container on which a substrate is put is placed, and an index robot 1200; a processing unit 200 that accomplishes substrate processing; and a buffer unit 4000 that is disposed between the processing unit 200 and the index unit 1000 and in which the substrates transported between them are temporarily remained. The processing unit 200 includes a processing module for glue removal disposed along a transfer channel to transport the substrate, a processing module for substrate cooling, a heat treatment module, and a functional water processing module. <P>COPYRIGHT: (C)2013,JPO&INPIT |
