| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate transfer method and a substrate transfer apparatus which widen the allowable range of the positioning adjustment of the substrate transfer apparatus itself and prevent damage to the substrate, the occurence of particles, and transfer failures of the substrate. <P>SOLUTION: In a substrate transfer method, a peripheral part of the substrate W is supported by a pair of support arms 171 and the support arm 171 and the substrate W are moved by movement mechanisms 162, 165 with a predetermined clearance formed between the support arm 171 and the peripheral part of the substrate W. The substrate W supported by the support arm 171 may be reversed. <P>COPYRIGHT: (C)2013,JPO&INPIT |
