发明名称 |
EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM |
摘要 |
An apparatus used with a laser apparatus may include a chamber, a target supply for supplying a target material to a region inside the chamber, a laser beam focusing optical system for focusing a laser beam from the laser apparatus in the region, and an optical system for controlling a beam intensity distribution of the laser beam. |
申请公布号 |
WO2012173266(A1) |
申请公布日期 |
2012.12.20 |
申请号 |
WO2012JP65443 |
申请日期 |
2012.06.12 |
申请人 |
GIGAPHOTON INC.;WAKABAYASHI, OSAMU;YANAGIDA, TATSUYA |
发明人 |
WAKABAYASHI, OSAMU;YANAGIDA, TATSUYA |
分类号 |
H05G2/00 |
主分类号 |
H05G2/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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