发明名称 |
Apparatus for etching semiconductor wafers |
摘要 |
A wafer pedestal of a semiconductor apparatus is provided. The wafer pedestal is capable of supporting a substrate. The wafer pedestal includes a pedestal having at least one purge opening configured to flow a purge gas and at least one chucking opening configured to chuck the substrate over the pedestal. The pedestal includes a sealing band disposed between the at least one purge opening and the at least one chucking opening. The sealing band is configured to support the substrate. |
申请公布号 |
US8333842(B2) |
申请公布日期 |
2012.12.18 |
申请号 |
US20080121599 |
申请日期 |
2008.05.15 |
申请人 |
LUBOMIRSKY DMITRY;TAN TIEN FAK;TSUEI LUN;APPLIED MATERIALS, INC. |
发明人 |
LUBOMIRSKY DMITRY;TAN TIEN FAK;TSUEI LUN |
分类号 |
H01L21/3065 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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