SYSTEM FOR THE HEAT TREATMENT OF SUBSTRATES, AND METHOD FOR DETECTING MEASUREMENT DATA IN SAID SYSTEM

摘要

The invention relates to a system (100) for the heat treatment of substrates and to a method for detecting measurement data in said system. The system (100) comprises at least one heatable chamber (102), a supporting system (108), a sensor arrangement (112), and an actuator (111) that is independent of the supporting system (108). The supporting system (108) is designed to support substrates, whereas the sensor arrangement (112) is further configured for coupling to a data-detecting and/or data-storing device (130). The actuator (111) is coupled to the sensor arrangement (112) and is configured to position the sensor arrangement (112) within the heatable chamber (102).